Veeco (VECO) Instruments announced receipt of an order for a Propel300 system from a major power semiconductor integrated device manufacturer, IDM, for gallium nitride, GaN, epitaxy on 300mm silicon wafers. This order cements Veeco’s position as a leader in 300mm MOCVD technology, building on years of experience including previous shipments of the Propel300 platform for various applications across the compound semiconductor industry. “Qualifying Propel300 for 300mm GaN-on-Si epitaxy for power devices is a significant achievement in the path to widespread adoption of GaN technology,” commented Anil Vijayendran, Vice President, MOCVD Product Line Management. “Moving from 200mm to 300mm enables customers to achieve 2.3 times more chips per wafer, while allowing them to use existing 300mm production lines, and ultimately lower their device costs”
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